We are happy to announce the launch of our highly sensitive HF/CI-10 sensor. With an average sensitivity 600 nA/ppm and a fast response time even traces in the TWA-level range can easily be detected. Hydrogen fluoride is the primary substance used in wafer production for etching and cleaning processes. Because of its high toxicity and corrosive behavior a rigorous monitoring is pivotal! Make sure your safety equipment works with the Membrapor HF/CI-10.
HF/CI-10 – Highly sensitive!
